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SemiXperts
Films & doping

Used deposition equipment for PVD, CVD and ALD

Refurbished sputter systems, e-beam evaporators, ALD and PECVD tools and 200 mm cluster platforms, rebuilt and serviced for research labs and pilot lines.

Tool types

Tool types

Sputter systems

Magnetron PVD of metals, nitrides and oxides, from single-chamber research tools to 200 mm cluster platforms.

Electron-beam evaporators

Directional evaporation of metals for lift-off, often with several crucibles and a planetary fixture.

PECVD systems

Low-temperature silicon oxide, nitride and amorphous silicon films for passivation, masks and optics.

Thermal ALD systems

Conformal oxide films such as Al2O3 and HfO2, one atomic layer at a time, popular in materials and device research.

CVD and etch cluster platforms

Multi-chamber 150 and 200 mm production tools for dielectric, tungsten and metal stacks.

Equipment

Tools we service

Deposition tools from bench-top research to 200 mm clusters

Deposition covers more different machines than any other category on this site. A teaching lab may only need a sputter coater and an evaporator; a pilot line may run a multi-chamber cluster tool that deposits a complete barrier and metal stack without breaking vacuum. What they have in common is vacuum, and most of the condition questions for used deposition equipment are vacuum questions.

We sell refurbished PVD, CVD and ALD tools and service the ones you already run, from pumps and gauges to sources, heaters and controllers.

Platforms and where they fit

Single-chamber PVD tools such as the Kurt J. Lesker PVD 75 are configured to order with sputter guns, thermal or e-beam sources, or a mix. They are the flexible choice for research groups that change materials often.

E-beam evaporators like the Temescal FC-2000 load several crucibles and a fixture of wafers in one run. They are the standard for metal lift-off. The trade-offs against sputtering are set out in our article on e-beam evaporation versus sputtering for lift-off.

PECVD systems such as the STS 310PC deposit silicon oxide and nitride at temperatures well below LPCVD, which suits processed wafers and polymer layers.

Thermal ALD tools like the Veeco (Cambridge NanoTech) Savannah grow conformal films in cycles. They are compact and widely used in research, but precursor handling governs where you can put one. Thermal ALD is strongest for oxides such as Al2O3 and HfO2; nitrides and most metals generally need a plasma tool or specific chemistries, so check your target films against the precursor lines fitted.

Cluster platforms such as the Applied Materials Endura 5500 and Centura 5200 group several process chambers around a central wafer handler. They are built for 150 and 200 mm production. They bring automation and repeatability, along with a large footprint and a long facilities list.

Inspection points for deposition equipment

A deposition tool can look clean and still fail on vacuum. Our inspection report covers:

  • base pressure and pump-down time compared with the original specification
  • helium leak check of the chamber, feedthroughs and gas lines
  • pump hours, oil condition or dry pump health, and cryopump regeneration where fitted
  • vacuum gauges checked against a reference
  • sources: magnetrons, e-beam gun and sweep, crucibles, heaters and showerheads
  • DC and RF power supplies, matching networks and the source shutters
  • substrate heating, rotation and the thickness monitor
  • shields and fixtures for build-up and flaking
  • controller, recipe handling and interlocks

Refurbishment and upgrades

Shields, fixtures and chamber liners take the build-up in a deposition tool, so they are cleaned or replaced as a matter of routine. Where the vacuum system is the weak point, vacuum system refurbishment covers pumps, valves, gauges and seals, with a leak test before and after.

Typical upgrades include new magnetron or e-beam power supplies, extra sputter sources, load locks on open-load systems and PC-based control to replace obsolete hardware. On cluster tools, conversion work and controller support are the deciding factors for how long the platform can stay in service.

What to confirm before buying

  • Materials. List the films you need now and in the next few years; sources and power supplies should match.
  • Precursors and gases. ALD and CVD need gas cabinets, detection and exhaust for hazardous chemistries; PVD needs argon, nitrogen and any reactive gases.
  • Cooling. Most sources and cryopumps need chilled water or a compressor; check capacity in your facility.
  • Floor space and access. Cluster tools need service access on several sides and a route into the cleanroom.
  • Wafer size. Research tools often take pieces and several wafer sizes on a fixture; cluster platforms are set to one size.

Tell us your films, thicknesses and substrates, and we will propose the deposition tools that fit your lab and budget.

FAQ

Questions and answers

Is sputtering or e-beam evaporation better for lift-off?

E-beam evaporation is usually preferred for lift-off because the flux is directional and sidewall coverage is low. Sputtering gives better step coverage and adhesion, which works against clean lift-off.

Can a single-chamber sputter tool be used for both metals and dielectrics?

Yes, if it has RF as well as DC power and suitable targets. Reactive sputtering of oxides and nitrides also needs the right gas lines and process control.

Are cluster tools like the Endura sensible for a small fab?

They make sense when you need repeatable 200 mm metal stacks at volume. For research with frequent material changes, a single-chamber tool is usually cheaper to run and easier to reconfigure.

What does a used ALD tool need in terms of precursors and safety?

Precursors such as trimethylaluminium are pyrophoric and need proper storage, delivery and exhaust. We review your precursor list and site rules before installation.

Do you supply targets, crucibles and other consumables?

We can advise on consumables for each platform and source spare parts. Targets and source materials are usually bought from material suppliers to your specification.

Guides

Related reading

All guides
Process know-how

Thermal vs plasma ALD: what a research lab needs

Thermal ALD gives the best conformality and the simplest tool. Plasma ALD adds lower temperatures and more materials. How to choose for a shared research lab.

Next step

Looking for a deposition tool?

Tell us the process, wafer size and facilities. We shortlist tools that fit and send an inspection report with every offer.