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Veeco (Cambridge NanoTech)

Veeco (Cambridge NanoTech) Savannah thermal ALD system

Pieces, 100 mm (4 in), 150 mm (6 in), 200 mm (8 in) · 2000s–2020s

The Savannah is a compact thermal ALD reactor used in many research cleanrooms for Al2O3, HfO2 and other oxides. We inspect, refurbish and reconfigure used S100 and S200 systems.

Price on request

Where the Savannah fits

The Savannah was developed by Cambridge NanoTech, which passed to Ultratech and then to Veeco, so older units carry the Cambridge NanoTech name. It is a compact thermal ALD reactor that became one of the most widespread ALD tools in academic cleanrooms. A used Savannah suits a research group or shared facility that needs conformal oxides for gate dielectrics, passivation, encapsulation or nanostructure coating, on pieces or wafers.

The tool has a small heated reactor, fast pneumatic pulse valves and precursor cylinders mounted on the frame. Most labs run Al2O3 from trimethylaluminium and water first, then add a second or third chemistry. For an overview of other film tools, see our deposition equipment page.

Thermal ALD and its limits

Thermal ALD gives excellent conformality with a simple, robust tool, but the chemistry range is narrower than in plasma ALD and some films need higher temperatures. If you are weighing a used Savannah against a plasma system, our post on thermal vs plasma ALD for research labs sets out where each one wins.

What we inspect

  • Pulse valves. Response, leak-by and seat condition; ALD valves are the highest-cycle part on the tool.
  • Heaters. Reactor, lid, precursor lines and cylinder jackets checked against setpoint with independent thermocouples.
  • Vacuum. Base pressure, pump condition and the foreline trap, which collects reaction products.
  • Flow. Carrier gas mass flow controller zero and span.
  • Process. For Certified systems, an Al2O3 test run with thickness and uniformity measured by ellipsometry.

The common wear points are ALD valve diaphragms, O-rings exposed to precursor, heater tape and controller channels, and powder build-up in the exhaust line and trap. Precursor cylinders are never sold with the tool unless empty, purged and documented.

Precursor handling and safety

Trimethylaluminium and diethylzinc ignite in air, and metal amide precursors for HfO2 or ZrO2 react with moisture, so line and cylinder work is a safety task, not routine maintenance. Before any line is opened we purge it with inert gas and confirm it is free of precursor. On installation we fit cylinders with your site's procedure, leak test every connection under vacuum and check the over-temperature limits on the cylinder heaters. Exact requirements depend on your precursors and your site's safety rules.

Refurbishment and upgrades

We decontaminate the reactor, lines and trap, replace valves and seals as needed, verify every heater zone and service the pump. See decontamination for how we handle tools that ran pyrophoric or toxic precursors. Upgrades include extra heated lines, an ozone source, a dry pump conversion and a controller or software update. We can also supply valves, heaters and seals as spare parts for systems you already run.

Facilities you will need

  • Single-phase power for the tool; pump power depending on pump type
  • Nitrogen or argon carrier gas of high purity
  • Clean dry air for the pneumatic valves
  • Ventilated enclosure or extraction for precursor cylinders
  • Exhaust for the pump outlet
  • Ozone destruct and monitoring, if an ozone generator is fitted

Buying advice

List the films you need and check them against lines, heaters and temperature range of the system on offer. Ask what precursors the tool has run, since that sets the decontamination effort and whether lines should be replaced. Plan a safety review for pyrophoric precursors early; it often takes longer than the installation.

Specifications

Typical configuration

Wafer sizes
Pieces, 100 mm (4 in), 150 mm (6 in), 200 mm (8 in)
Process
Thermal ALD, continuous and exposure modes
Models
S100 (up to 100 mm), S200 (up to 200 mm); S300 for 300 mm
Precursor lines
Typically two or more heated lines, up to six depending on configuration
Substrate temperature
Up to 350–400 °C, depending on model and configuration
Reactor
Low-volume heated chamber with fast pneumatic pulse valves
Pumping
Rotary vane or dry pump with heated foreline trap, typical

Typical values for the platform. Each tool’s inspection report lists its actual configuration.

Services

What we do for the Savannah

Refurbishment

Rebuild used tools to their original specification, with a written scope and a test report.

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Upgrades

Retrofit older tools with new controls, light sources, pumps, wafer sizes or endpoint detection.

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Maintenance

Keep older process tools running with planned maintenance, repair, calibration and parts.

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Installation

Moving a process tool from one cleanroom to another, and getting it running at the new site.

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Upgrades

Common upgrades

About upgrades
  • Additional heated precursor lines and cylinder heaters
  • Ozone generator for oxide processes at lower temperature
  • Dry pump in place of an oil-sealed pump, with an improved foreline trap
  • Software and controller update

Need a spare part for the Savannah? Send us the part number and we will check what we can supply.

FAQ

Questions and answers

Which films can a Savannah deposit?

Thermal oxides such as Al2O3, HfO2, ZrO2, TiO2 and ZnO are common, depending on the precursors and lines fitted. Nitrides and metals generally need a plasma tool or specific chemistries, so we check your target films against the configuration.

What is exposure mode?

The pump valve closes during each precursor pulse so the gas has time to diffuse into deep trenches, pores or powders. It is slower than continuous mode but gives better coverage on very high aspect ratio structures.

Does a used Savannah need a gas cabinet?

Most research precursors such as trimethylaluminium are liquids in small cylinders on the tool, but they are pyrophoric or reactive and need a ventilated enclosure and a site safety review. Any gaseous precursors or ozone add their own requirements.

S100 or S200?

The S100 suits pieces and wafers up to 100 mm and has a smaller footprint. The S200 takes up to 200 mm wafers and batches of smaller samples, which is useful when several groups share the tool.

Deposition

More tools in this category

All deposition
Guides

Related reading

All guides
Process know-how

Thermal vs plasma ALD: what a research lab needs

Thermal ALD gives the best conformality and the simplest tool. Plasma ALD adds lower temperatures and more materials. How to choose for a shared research lab.

Next step

Interested in the Veeco (Cambridge NanoTech) Savannah?

Tell us the process, wafer size and facilities. We reply with availability, an inspection report and a refurbishment scope.