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STS (now SPTS)

STS (now SPTS) 310PC PECVD system

Pieces, 100 mm (4 in), 150 mm (6 in) · 1990s–2000s

The STS 310PC is a parallel-plate PECVD reactor for silicon oxide, nitride and amorphous silicon. We inspect, refurbish and update the controls on used systems for research and MEMS work.

Price on request

Where the STS 310PC fits

The 310PC was built by Surface Technology Systems in the UK, a supplier whose plasma tools spread widely through university and MEMS cleanrooms. It is a single-chamber, parallel-plate PECVD reactor that deposits silicon dioxide, silicon nitride, oxynitride and amorphous silicon at temperatures far below a furnace. A used 310PC suits a lab that needs passivation, hard masks, sacrificial layers or optical films on pieces and wafers up to about 150 mm.

Its strength is the mixed-frequency RF arrangement: a 13.56 MHz supply combined with a low-frequency generator lets you set film stress, which matters for membranes, cantilevers and thick layers. Exact frequencies vary between systems, so we list them for each tool. See our deposition equipment page for alternative deposition routes.

PECVD or a furnace

PECVD nitride is hydrogen-rich and less dense than LPCVD nitride but grows at a fraction of the temperature and on substrates that already carry metal. Our post on PECVD vs LPCVD silicon nitride compares film properties and tool choice for typical research processes.

What we inspect

We pump the chamber down and log base pressure and leak rate, then check the heated electrode against its setpoint with an independent probe. Both RF generators are run into a dummy load and then on plasma, with reflected power and match tuning recorded. Every mass flow controller is checked for zero and flow, the gas pod is leak tested and the interlocks for toxic gas and exhaust are traced.

Common wear points on this platform are:

  • showerhead and electrode surfaces with heavy deposit or arcing marks
  • heater elements and thermocouples in the lower electrode
  • RF match capacitors and relays
  • mass flow controllers that have drifted after years of silane service
  • the original control PC, its interface cards and storage

Refurbishment and upgrades

Refurbishment covers chamber and showerhead cleaning or replacement, new seals, heater and thermocouple checks, gas line leak testing and pump service. For Certified systems we deposit oxide and nitride test films and report thickness, refractive index and uniformity.

The most frequent upgrade is a control system retrofit: the original computer and software are replaced with current hardware and recipe control, while the process hardware stays the same. Other upgrades include new RF generators, new mass flow controllers and a dry pump conversion, which suits silane chemistry better than an oil-sealed pump.

Facilities you will need

  • Single- or three-phase power, depending on pump and generator configuration
  • Cooling water for the RF generators and pump, depending on configuration
  • Clean dry air for valves
  • Nitrogen for purge and venting
  • Silane, ammonia, nitrous oxide and clean gases, with gas detection
  • Exhaust to a scrubber or burn box suited to silane

Buying advice

Check which gases the tool has run and which lines are fitted before planning your recipes. Confirm the RF configuration if stress control matters to you. Budget for gas safety hook-up; on most sites it costs more time than moving and installing the tool.

Specifications

Typical configuration

Wafer sizes
Pieces, 100 mm (4 in), 150 mm (6 in)
Reactor
Parallel-plate, heated lower electrode
RF
13.56 MHz plus a low-frequency generator for mixed-frequency stress control, depending on configuration
Typical films
SiO2, Si3N4, SiOxNy, amorphous Si
Process temperature
Typically around 300 °C, depending on configuration
Typical gases
SiH4, NH3, N2O, N2, with CF4/O2 chamber clean, depending on configuration
Substrates
Pieces and wafers up to 150 mm (6 in), depending on configuration

Typical values for the platform. Each tool’s inspection report lists its actual configuration.

Services

What we do for the 310PC

Refurbishment

Rebuild used tools to their original specification, with a written scope and a test report.

Learn more

Upgrades

Retrofit older tools with new controls, light sources, pumps, wafer sizes or endpoint detection.

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Maintenance

Keep older process tools running with planned maintenance, repair, calibration and parts.

Learn more

Installation

Moving a process tool from one cleanroom to another, and getting it running at the new site.

Learn more
Upgrades

Common upgrades

About upgrades
  • Control system retrofit to replace the original DOS-era PC and interface
  • New RF generators or matching networks
  • Mass flow controller replacement
  • Dry pump in place of an oil-sealed rotary pump

Need a spare part for the 310PC? Send us the part number and we will check what we can supply.

FAQ

Questions and answers

Why does mixed-frequency matter on a PECVD?

Alternating or mixing the high- and low-frequency RF lets you tune film stress from tensile to compressive. For MEMS membranes and thick passivation layers that is often the main reason to choose this tool.

Is the original control software still usable?

Many 310PC systems still run on their original PC-based software, which works but is hard to support. We check the computer and interface during inspection and can quote a retrofit if spare hardware is a concern.

Can a 310PC run TEOS oxide?

Some STS PECVD systems were configured for liquid TEOS delivery as well as silane. Whether a particular tool can depends on the hardware fitted, which we document.

What facilities make PECVD installation harder?

Silane and ammonia supply with gas detection, and an exhaust or abatement route that suits them, are usually the long-lead items. The tool itself is compact.

Deposition

More tools in this category

All deposition
Guides

Related reading

All guides
Next step

Interested in the STS (now SPTS) 310PC?

Tell us the process, wafer size and facilities. We reply with availability, an inspection report and a refurbishment scope.