PECVD vs LPCVD silicon nitride: which film for which job
Temperature, stress, hydrogen content and etch resistance separate PECVD and LPCVD nitride. How to choose the process, and the tool, for your device.
Pieces, 100 mm (4 in), 150 mm (6 in), 200 mm (8 in) · 1990s–2020s
The JetFirst is a cold-wall, lamp-heated RTP made in France, in versions from pieces up to 200 mm wafers. We inspect, refurbish and upgrade used systems.
Price on request
Jipelec, a French brand now part of the ECM group, makes the JetFirst family of rapid thermal processors for research and development labs. The models are named after the largest wafer they take, from the JetFirst 100 for pieces and small wafers to the JetFirst 200 for 200 mm. All use halogen lamps to heat a single substrate inside a water-cooled, cold-wall chamber, which keeps the walls clean and allows fast cool-down.
A used Jipelec JetFirst suits labs that anneal pieces, III-V or silicon wafers, or run rapid thermal oxidation and nitridation, and want a compact tool with recipe control. It is found in research cleanrooms in Europe and elsewhere. For furnaces and other RTP options, see thermal processing equipment.
Performance figures vary widely between JetFirst systems, because each was built with different lamps, sensing and options. Before you compare listings, check:
We test and state these for every system we offer, rather than repeating a catalogue figure. Installed units show why: research facilities list JetFirst systems with very different maximum temperatures and ramp rates, because many were set up for a narrow process window rather than the full range of the model.
We run the system through its recipes and check lamp output zone by zone, temperature overshoot and stability, and cooling time. The chamber is inspected for window clouding, seal condition and deposits. Gas lines and mass flow controllers are checked for leaks and flow, and the pyrometer and thermocouples are compared against a reference wafer. If vacuum is fitted, we record base pressure and pump condition.
Typical wear points are lamps, the quartz window, chamber O-rings that see heat, thermocouple wires and connectors and older controller PCs.
Refurbishment covers lamp replacement, window cleaning or replacement, new seals, gas line leak tests and temperature calibration. Certified systems run an agreed test anneal or oxidation with the results in the report.
Upgrades include extra gas lines, vacuum pumping, new carriers and a controller update. Our post on keeping legacy tools running covers how we keep older controllers alive or replace them, and our operator training service gets new users running safe, repeatable recipes after installation.
Match the model to your largest substrate and your temperature range, then check the sensing configuration. Ask for lamp replacement history and any calibration records. A smaller model with the right gases often serves a research lab better than a larger one without them.
Typical values for the platform. Each tool’s inspection report lists its actual configuration.
Rebuild used tools to their original specification, with a written scope and a test report.
Learn moreRetrofit older tools with new controls, light sources, pumps, wafer sizes or endpoint detection.
Learn moreKeep older process tools running with planned maintenance, repair, calibration and parts.
Learn moreMoving a process tool from one cleanroom to another, and getting it running at the new site.
Learn moreNeed a spare part for the JetFirst? Send us the part number and we will check what we can supply.
The number in the model name is the maximum wafer size in millimetres. If you work on pieces and 100 mm wafers, a JetFirst 100 typically has a smaller chamber and footprint than a 200.
The JetFirst heats the wafer with lamps through a window into a water-cooled chamber, while a Heatpulse heats through a quartz isolation tube. Both are single-wafer RTPs; chamber design affects cleaning, gas options and whether vacuum is possible.
Yes, with the right gases fitted. Rapid thermal oxidation and nitridation are common uses alongside implant anneal and contact alloying.
Halogen lamps, the quartz window, susceptors and thermocouples. Their condition is listed in the inspection report.
200 mm (8 in) · 1990s–2020s
200 mm (8 in) · 1990s–2020s
Temperature, stress, hydrogen content and etch resistance separate PECVD and LPCVD nitride. How to choose the process, and the tool, for your device.
When a dry pump conversion pays off on an etcher, CVD tool or evaporator, how to size the replacement and what changes in facilities and interlocks.
Substrates, tool availability, automation and facilities all change between 150 and 200 mm. How to pick a wafer size for a pilot line built on used tools.
Tell us the process, wafer size and facilities. We reply with availability, an inspection report and a refurbishment scope.